Fuser member

ABSTRACT

The present teachings provide a fuser member. The fuser member includes a substrate layer comprising a polymer blend polyimide polymer and amino silicone.

BACKGROUND

1. Field of Use

This disclosure is generally directed to fuser members useful inelectrophotographic imaging apparatuses, including digital, image onimage, and the like. In addition, the fuser member described herein canalso be used in a transfix apparatus in a solid ink jet printingmachine.

2. Background

Centrifugal molding is used to obtain seamless polyimide belts useful asfuser members. Typically, a thin fluorine or silicone release layer isapplied to the inner surface of a rigid cylindrical mandrel. A polyimidecoating is applied to the inner surface of the mandrel containing therelease layer. The polyimide is cured and then released from themandrel. This process results in a high unit manufacturing cost for thefinal fuser belt.

There are drawbacks to this process. The length of the polyimide belt isdetermined by the size of the mandrel. The requirement of a releaselayer on the inner surface of the mandrel is an additional process step.For fuser belts manufactured in this manner the cost is expensive. Thereis a need to reduce the manufacturing cost.

In addition, a polyimide fuser belt requires a modulus that is greaterthan 4,000 MPa. It is preferable the onset decomposition temperature begreater than 400° C. Such requirements, along with reduced cost ofmanufacturing are desirable.

SUMMARY

According to an embodiment, a fuser member is provided. The fuser memberincludes a substrate layer comprising a polyimide polymer and aminosilicone.

According to another embodiment, there is described a fuser memberincluding a substrate layer comprising a polyimide polymer and aminosilicone. Disposed on the substrate layer is an intermediate layercomprising a material selected from the group consisting of silicone andfluoroelastomer. A fluoropolymer release layer is disposed on theintermediate layer.

According to another embodiment there is provided a composition of afuser member comprising a layer comprising a polymer blend of polyimideand amino silicone, represented by the structures selected from thegroup consisting of

wherein the organic group is one of —RNH₂, —RNHR′NH₂; R, R′ and R″ eachrepresent an alkyl having from about 1 to about 8 carbon atoms; n isfrom about 1 to about 100 and m is from about 1 to about 100.

BRIEF DESCRIPTION OF THE DRAWINGS

The accompanying drawings, which are incorporated in and constitute apart of this specification, illustrate several embodiments of thepresent teachings and together with the description, serve to explainthe principles of the present teachings.

FIG. 1 depicts an exemplary fuser member having a belt substrate inaccordance with the present teachings.

FIGS. 2A-2B depict exemplary fusing configurations using the fusermember shown in FIG. 1 in accordance with the present teachings.

FIG. 3 depicts a fuser configuration using a transfix apparatus.

FIG. 4 depicts a tensioning of a fusing member for final curing.

It should be noted that some details of the figures have been simplifiedand are drawn to facilitate understanding of the embodiments rather thanto maintain strict structural accuracy, detail, and scale.

DESCRIPTION OF THE EMBODIMENTS

Reference will now be made in detail to embodiments of the presentteachings, examples of which are illustrated in the accompanyingdrawings. Wherever possible, the same reference numbers will be usedthroughout the drawings to refer to the same or like parts.

In the following description, reference is made to the accompanyingdrawings that form a part thereof, and in which is shown by way ofillustration specific exemplary embodiments in which the presentteachings may be practiced. These embodiments are described insufficient detail to enable those skilled in the art to practice thepresent teachings and it is to be understood that other embodiments maybe utilized and that changes may be made without departing from thescope of the present teachings. The following description is, therefore,merely exemplary.

Furthermore, to the extent that the terms “including”, “includes”,“having”, “has”, “with”, or variants thereof are used in either thedetailed description and the claims, such terms are intended to beinclusive in a manner similar to the term “comprising.” The term “atleast one of” is used to mean that one or more of the listed items canbe selected.

Notwithstanding that the numerical ranges and parameters setting forththe broad scope of the invention are approximations, the numericalvalues set forth in the specific examples are reported as precisely aspossible. Any numerical value, however, inherently contains certainerrors necessarily resulting from the standard deviation found in theirrespective testing measurements. Moreover, all ranges disclosed hereinare to be understood to encompass any and all sub-ranges subsumedtherein. For example, a range of “less than 10” can include any and allsub-ranges between (and including) the minimum value of zero and themaximum value of 10, that is, any and all sub-ranges having a minimumvalue of equal to or greater than zero and a maximum value of equal toor less than 10, e.g., 1 to 5. In certain cases, the numerical values asstated for the parameter can take on negative values. In this case, theexample value of range stated as “less than 10” can assume negativevalues, e.g. −1, −2, −3, −10, −20, −30, etc.

The fuser or fixing member can include a substrate having one or morefunctional intermediate layers formed thereon. The substrate describedherein includes a belt. The one or more intermediate layers includecushioning layers and release layers. Such fuser member can be used asan oil-less fusing member for high speed, high qualityelectrophotographic printing to ensure and maintain a good toner releasefrom the fused toner image on an image supporting material (e.g., apaper sheet), and further assist paper stripping.

In various embodiments, the fuser member can include, for example, asubstrate, with one or more functional intermediate layers formedthereon. The substrate can be formed in various shapes, such as a belt,or a film, using suitable materials that are non-conductive orconductive depending on a specific configuration, for example, as shownin FIG. 1.

In FIG. 1, an exemplary embodiment of a fusing or transfix member 200can include a belt substrate 210 with one or more functionalintermediate layers, e.g., 220 and an outer surface layer 230 formedthereon. The outer surface layer 230 is also referred to as a releaselayer. The belt substrate 210 is described further and is made of apolyimide polymer and an amino silicone.

Functional Intermediate Layer

Examples of materials used for the functional intermediate layer 220(also referred to as cushioning layer or intermediate layer) includefluorosilicones, silicone rubbers such as room temperature vulcanization(RTV) silicone rubbers, high temperature vulcanization (HTV) siliconerubbers, and low temperature vulcanization (LTV) silicone rubbers. Theserubbers are known and readily available commercially, such as SILASTIC®735 black RTV and SILASTIC® 732 RTV, both from Dow Corning; 106 RTVSilicone Rubber and 90 RTV Silicone Rubber, both from General Electric;and JCR6115CLEAR HTV and SE4705U HTV silicone rubbers from Dow CorningToray Silicones. Other suitable silicone materials include siloxanes(such as polydimethylsiloxanes); fluorosilicones such as Silicone Rubber552, available from Sampson Coatings, Richmond, Va.; liquid siliconerubbers such as vinyl crosslinked heat curable rubbers or silanol roomtemperature crosslinked materials; and the like. Another specificexample is Dow Corning Sylgard 182. Commercially available LSR rubbersinclude Dow Corning Q3-6395, Q3-6396, SILASTIC® 590 LSR, SILASTIC® 591LSR, SILASTIC® 595 LSR, SILASTIC® 596 LSR, and SILASTIC® 598 LSR fromDow Corning. The functional layers provide elasticity and can be mixedwith inorganic particles, for example SiC or Al₂O₃, as required.

Other examples of the materials suitable for use as functionalintermediate layer 220 also include fluoroelastomers. Fluoroelastomersare from the class of 1) copolymers of two of vinylidenefluoride,hexafluoropropylene, and tetrafluoroethylene; 2) terpolymers ofvinylidenefluoride, hexafluoropropylene, and tetrafluoroethylene; and 3)tetrapolymers of vinylidenefluoride, hexafluoropropylene,tetrafluoroethylene, and a cure site monomer. These fluoroelastomers areknown commercially under various designations such as VITON A®, VITON B®VITON E® VITON E 60C®, VITON E430®, VITON 910®, VITON GH®; VITON GF®;and VITON ETP®. The VITON® designation is a trademark of E.I. DuPont deNemours, Inc. The cure site monomer can be4-bromoperfluorobutene-1,1,1-dihydro-4-bromoperfluorobutene-1,3-bromoperfluoropropene-1,1,1-dihydro-3-bromoperfluoropropene-1,or any other suitable, known cure site monomer, such as thosecommercially available from DuPont. Other commercially availablefluoropolymers include FLUOREL 2170®, FLUOREL 2174®, FLUOREL 2176®,FLUOREL 2177® and FLUOREL LVS 76®, FLUOREL® being a registered trademarkof 3M Company. Additional commercially available materials includeAFLAS™ a poly(propylene-tetrafluoroethylene), and FLUOREL II® (LII900) apoly(propylene-tetrafluoroethylenevinylidenefluoride), both alsoavailable from 3M Company, as well as the Tecnoflons identified asFOR-60KIR®, FOR-LHF®, NM® FOR-THF®, FOR-TFS®, TH®, NH®, P757®, TNS®,T439®, PL958®, BR9151® and TN505®, available from Ausimont.

Examples of three known fluoroelastomers are (1) a class of copolymersof two of vinylidenefluoride, hexafluoropropylene, andtetrafluoroethylene, such as those known commercially as VITON A®; (2) aclass of terpolymers of vinylidenefluoride, hexafluoropropylene, andtetrafluoroethylene known commercially as VITON B®; and (3) a class oftetrapolymers of vinylidenefluoride, hexafluoropropylene,tetrafluoroethylene, and a cure site monomer known commercially as VITONGH® or VITON GF®.

The fluoroelastomers VITON GH® and VITON GF® have relatively low amountsof vinylidenefluoride. VITON GF® and VITON GH® have about 35 weightpercent of vinylidenefluoride, about 34 weight percent ofhexafluoropropylene, and about 29 weight percent of tetrafluoroethylene,with about 2 weight percent cure site monomer.

The thickness of the functional intermediate layer 220 is from about 30microns to about 1,000 microns, or from about 100 microns to about 800microns, or from about 150 to about 500 microns.

Release Layer

An exemplary embodiment of a release layer 230 includes fluoropolymerparticles. Fluoropolymer particles suitable for use in the formulationdescribed herein include fluorine-containing polymers. These polymersinclude fluoropolymers comprising a monomeric repeat unit that isselected from the group consisting of vinylidene fluoride,hexafluoropropylene, tetrafluoroethylene, perfluoroalkylvinylether, andmixtures thereof. The fluoropolymers may include linear or branchedpolymers, and cross-linked fluoroelastomers. Examples of fluoropolymerinclude polytetrafluoroethylene (PTFE); perfluoroalkoxy polymer resin(PFA); copolymer of tetrafluoroethylene (TFE) and hexafluoropropylene(HFP); copolymers of hexafluoropropylene (HFP) and vinylidene fluoride(VDF or VF2); terpolymers of tetrafluoroethylene (TFE), vinylidenefluoride (VDF), and hexafluoropropylene (HFP); and tetrapolymers oftetrafluoroethylene (TFE), vinylidene fluoride (VF2), andhexafluoropropylene (HFP), and mixtures thereof. The fluoropolymerparticles provide chemical and thermal stability and have a low surfaceenergy. The fluoropolymer particles have a melting temperature of fromabout 255° C. to about 360° C. or from about 280° C. to about 330° C.These particles are melted to form the release layer.

For the fuser member 200, the thickness of the outer surface layer orrelease layer 230 can be from about 10 microns to about 100 microns, orfrom about 20 microns to about 80 microns, or from about 40 microns toabout 60 microns.

Adhesive Layer(s)

Optionally, any known and available suitable adhesive layer, alsoreferred to as a primer layer, may be positioned between the releaselayer 230, the functional intermediate layer 220 and the substrate 210.Examples of suitable adhesives include silanes such as amino silanes(such as, for example, HV Primer 10 from Dow Corning), titanates,zirconates, aluminates, and the like, and mixtures thereof. In anembodiment, an adhesive in from about 0.001 percent to about 10 percentsolution can be wiped on the substrate. The adhesive layer can be coatedon the substrate, or on the outer layer, to a thickness of from about 2nanometers to about 2,000 nanometers, or from about 2 nanometers toabout 500 nanometers. The adhesive can be coated by any suitable knowntechnique, including spray coating or wiping.

FIGS. 2A and 2B depict an exemplary fusing configuration for the fusingprocess in accordance with the present teachings. It should be readilyapparent to one of ordinary skill in the art that the fusingconfigurations 300B and 400B depicted in FIGS. 2A-2B, respectively,represent generalized schematic illustrations and that othermembers/layers/substrates/configurations can be added or existingmembers/layers/substrates/configurations can be removed or modified.Although an electrophotographic printer is described herein, thedisclosed apparatus and method can be applied to other printingtechnologies. Examples include offset printing and inkjet and solidtransfix machines.

FIG. 2A depicts the fusing configuration 300B using a fuser belt shownin FIG. 1 in accordance with the present teachings. The configuration300B can include a fuser belt of FIG. 1 that forms a fuser nip with apressure applying mechanism 335, such as a pressure belt, for an imagesupporting material 315. In various embodiments, the pressure applyingmechanism 335 can be used in combination with a heat lamp (not shown) toprovide both the pressure and heat for the fusing process of the tonerparticles on the image supporting material 315. In addition, theconfiguration 300B can include one or more external heat rolls 350 alongwith, e.g., a cleaning web 360, as shown in FIG. 2A.

FIG. 2B depicts the fusing configuration 400B using a fuser belt shownin FIG. 1 in accordance with the present teachings. The configuration400B can include a fuser belt (i.e., 200 of FIG. 1) that forms a fusernip with a pressure applying mechanism 435, such as a pressure belt inFIG. 2B, for a media substrate 415. In various embodiments, the pressureapplying mechanism 435 can be used in a combination with a heat lamp toprovide both the pressure and heat for the fusing process of the tonerparticles on the media substrate 415. In addition, the configuration400B can include a mechanical system 445 to move the fuser belt 200 andthus fusing the toner particles and forming images on the mediasubstrate 415. The mechanical system 445 can include one or more rolls445 a-c, which can also be used as heat rolls when needed.

FIG. 3 demonstrates a view of an embodiment of a transfix member 7 whichmay be in the form of a belt, sheet, film, or like form. The transfixmember 7 is constructed similarly to the fuser belt described above. Thedeveloped image 12 positioned on intermediate transfer member 1, isbrought into contact with and transferred to transfix member 7 viarollers 4 and 8. Roller 4 and/or roller 8 may or may not have heatassociated therewith. Transfix member 7 proceeds in the direction ofarrow 13. The developed image is transferred and fused to a copysubstrate 9 as copy substrate 9 is advanced between rollers 10 and 11.Rollers 10 and/or 11 may or may not have heat associated therewith.

Described herein is a polyimide composition suitable for use as asubstrate layer 210 of FIG. 1. The polyimide composition includes aninternal release agent that self releases from a metal substrate such asstainless steel. The polyimide composition comprises a polyamic acid andan internal release agent of an amino silicone that self-releases from ametal substrate such as stainless steel. Most references report applyingan external release layer on the metal substrate before coating thepolyimide layer and then releasing it. The disclosed composition is costeffective since only one coating layer is needed.

Substrate Layer

The substrate layer 210 disclosed herein is a polyimide compositioncomprising an internal release agent of amino silicone thatself-releases from a metal substrate such as stainless steel. The priorart teaches applying an external release layer on the metal substratebefore coating the polyimide layer, and then releasing it. The disclosedcomposition is cost effective since only one coating layer is needed.

The disclosed polyamic acid includes one of a polyamic acid ofpyromellitic dianhydride/4,4′-oxydianiline, a polyamic acid ofpyromellitic dianhydride/phenylenediamine, a polyamic acid of biphenyltetracarboxylic dianhydride/4,4′-oxydianiline, a polyamic acid ofbiphenyl tetracarboxylic dianhydride/phenylenediamine, a polyamic acidof benzophenone tetracarboxylic dianhydride/4,4′-oxydianiline, apolyamic acid of benzophenone tetracarboxylicdianhydride/4,4′-oxydianiline/phenylenediamine, and the like andmixtures thereof.

Commercial examples of polyamic acid of pyromelliticdianhydride/4,4-oxydianiline include PYRE-ML RC5019 (about 15-16 weightpercent in N-methyl-2-pyrrolidone, NMP), RC5057 (about 14.5-15.5 weightpercent in NMP/aromatic hydrocarbon=80/20), and RC5083 (about 18-19weight percent in NMP/DMAc=15/85), all from Industrial Summit technologyCorp., Parlin, N.J.; and DURIMIDE® 100, commercially available fromFUJIFILM Electronic Materials U.S.A., Inc.

Commercial examples of polyamic acid of biphenyl tetracarboxylicdianhydride/4,4′-oxydianiline include U-VARNISH A and S (about 20 weightin NMP), both from UBE America Inc., New York, N.Y.

Commercial examples of polyamic acid of biphenyl tetracarboxylicdianhydride/phenylenediamine include PI-2610 (about 10.5 weight in NMP)and PI-2611 (about 13.5 weight in NMP), both from HD MicroSystems,Parlin, N.J.

Commercial examples of polyamic acid of benzophenone tetracarboxylicdianhydride/4,4′-oxydianiline include RP46 and RP50 (about 18 weightpercent in NMP), both from Unitech Corp., Hampton, Va.

Commercial examples of polyamic acid of benzophenone tetracarboxylicdianhydride/4,4′-oxydianiline/phenylenediamine include PI-2525 (about 25weight percent in NMP), PI-2574 (about 25 weight percent in NMP),PI-2555 (about 19 weight percent in NMP/aromatic hydrocarbon=80/20), andPI-2556 (about 15 weight percent in NMP/aromatic hydrocarbon/propyleneglycol methyl ether=70/15/15), all from HD MicroSystems, Parlin, N.J.

Various amounts of polyamic acid can be selected for the substrate, suchas for example, from about 90 to about 99.9 weight percent, from about95 to about 99.8 weight percent, or from about 97 to about 99.5 weightpercent.

Other polyamic acid or ester of polyamic acid examples that can beincluded in the intermediate transfer member are from the reaction of adianhydride and a diamine. Suitable dianhydrides include aromaticdianhydrides and aromatic tetracarboxylic acid dianhydrides such as, forexample, 9,9-bis(trifluoromethyl)xanthene-2,3,6,7-tetracarboxylic aciddianhydride, 2,2-bis(3,4-dicarboxyphenyl)hexafluoropropane dianhydride,2,2-bis((3,4-dicarboxyphenoxy)phenyl)hexafluoropropane dianhydride,4,4′-bis(3,4-dicarboxy-2,5,6-trifluorophenoxy)octafluorobiphenyldianhydride, 3,3′,4,4′-tetracarboxybiphenyl dianhydride,3,3′,4,4′-tetracarboxybenzophenone dianhydride,di-(4-(3,4-dicarboxyphenoxy)phenyl)ether dianhydride,di-(4-(3,4-dicarboxyphenoxy)phenyl) sulfide dianhydride,di-(3,4-dicarboxyphenyl)methane dianhydride,di-(3,4-dicarboxyphenyl)ether dianhydride, 1,2,4,5-tetracarboxybenzenedianhydride, 1,2,4-tricarboxybenzene dianhydride, butanetetracarboxylicdianhydride, cyclopentanetetracarboxylic dianhydride, pyromelliticdianhydride, 1,2,3,4-benzenetetracarboxylic dianhydride,2,3,6,7-naphthalenetetracarboxylic dianhydride,1,4,5,8-naphthalenetetracarboxylic dianhydride,1,2,5,6-naphthalenetetracarboxylic dianhydride,3,4,9,10-perylenetetracarboxylic dianhydride, 2,3,6,7-anthracenetetracarboxylic dianhydride, 1,2,7,8-phenanthrenetetracarboxylicdianhydride, 3,3′,4,4′-biphenyltetracarboxylic dianhydride,2,2′,3,3′-biphenyltetracarboxylic dianhydride,3,3′,4-4′-benzophenonetetracarboxylic dianhydride,2,2′,3,3′-benzophenonetetracarboxylic dianhydride,2,2-bis(3,4-dicarboxyphenyl)propane dianhydride,2,2-bis(2,3-dicarboxyphenyl)propane dianhydride,bis(3,4-dicarboxyphenyl)ether dianhydride, bis(2,3-dicarboxyphenyl)etherdianhydride, bis(3,4-dicarboxyphenyl)sulfone dianhydride,bis(2,3-dicarboxyphenyl)sulfone2,2-bis(3,4-dicarboxyphenyl)-1,1,1,3,3,3-hexafluoropropane dianhydride,2,2-bis(3,4-dicarboxyphenyl)-1,1,1,3,3,3-hexachloropropane dianhydride,1,1-bis(2,3-dicarboxyphenyl)ethane dianhydride,1,1-bis(3,4-dicarboxyphenyl)ethane dianhydride,bis(2,3-dicarboxyphenyl)methane dianhydride,bis(3,4-dicarboxyphenyl)methane dianhydride, 4,4′-(p-phenylenedioxy)diphthalic dianhydride, 4,4′-(m-phenylenedioxy)diphthalic dianhydride,4,4′-diphenylsulfidedioxybis(4-phthalic acid)dianhydride,4,4′-diphenylsulfonedioxybis(4-phthalic acid)dianhydride,methylenebis(4-phenyleneoxy-4-phthalic acid)dianhydride,ethylidenebis(4-phenyleneoxy-4-phthalic acid)dianhydride,isopropylidenebis-(4-phenyleneoxy-4-phthalic acid)dianhydride,hexafluoroisopropylidenebis(4-phenyleneoxy-4-phthalic acid)dianhydride,and the like. Exemplary diamines suitable for use in the preparation ofthe polyamic acid include 4,4′-bis-(m-aminophenoxy)-biphenyl,4,4′-bis-(m-aminophenoxy)-diphenyl sulfide,4,4′-bis-(m-aminophenoxy)-diphenyl sulfone,4,4′-bis-(p-aminophenoxy)-benzophenone,4,4′-bis-(p-aminophenoxy)-diphenyl sulfide,4,4′-bis-(p-aminophenoxy)-diphenyl sulfone, 4,4′-diamino-azobenzene,4,4′-diaminobiphenyl, 4,4′-diaminodiphenylsulfone,4,4′-diamino-p-terphenyl,1,3-bis-(gamma-aminopropyl)-tetramethyl-disiloxane, 1,6-diaminohexane,4,4′-diaminodiphenylmethane, 3,3′-diaminodiphenylmethane,1,3-diaminobenzene, 4,4′-diaminodiphenyl ether,2,4′-diaminodiphenylether, 3,3′-diaminodiphenylether,3,4′-diaminodiphenylether, 1,4-diaminobenzene,4,4′-diamino-2,2′,3,3′,5,5′,6,6′-octafluoro-biphenyl,4,4′-diamino-2,2′,3,3′,5,5′,6,6′-octafluorodiphenyl ether,bis[4-(3-aminophenoxy)-phenyl]sulfide,bis[4-(3-aminophenoxy)phenyl]sulfone,bis[4-(3-aminophenoxy)phenyl]ketone, 4,4′-bis(3-aminophenoxy)biphenyl,2,2-bis[4-(3-aminophenoxy)phenyl]-propane,2,2-bis[4-(3-aminophenoxy)phenyl]-1,1,1,3,3,3-hexafluoropropane,4,4′-diaminodiphenyl sulfide, 4,4′-diaminodiphenyl ether,4,4′-diaminodiphenyl sulfone, 4,4′-diaminodiphenylmethane,1,1-di(p-aminophenyl)ethane, 2,2-di(p-aminophenyl)propane, and2,2-di(p-aminophenyl)-1,1,1,3,3,3-hexafluoropropane, and the like andmixtures thereof.

The dianhydrides and diamines are, for example, selected in a weightratio of dianhydride to diamine of from about 20:80 to about 80:20, andmore specifically, in an about 50:50 weight ratio. The above aromaticdianhydride like aromatic tetracarboxylic acid dianhydrides and diamineslike aromatic diamines are used singly or as a mixture, respectively.

Silicone itself is widely used as releasing agent. However, when mixedwith a polyamic acid, it is incompatible with the polyamic acid coatingsolution (phase separation), and the resulting polyimide shows clearphase separation and the releasing of the polyimide from the coatingsubstrate varies and is very difficult to control. Using afunctionalized silicone, such as an amino silicone, which is compatiblewith the coating solution (clear when mixed), and the resultingpolyimide is also clear with no apparent phase separation. In addition,the amino silicone can chemically interact with the polyamic acid, thusbe incorporated into the polyimide network. The resulting polyimide selfreleases from the metal coating substrate consistently.

The amino silicone can be dual end type such as KF-8010 (functionalgroup equivalent weight=430 g/mol), X-22-161B (functional groupequivalent weight=1,500 g/mol), or KF-8012 (functional group equivalentweight=2,200 g/mol); or side chain type including mono amino such asKF-864 (functional group equivalent weight=3,800 g/mol), diamino such asKF-393 (functional group equivalent weight=350 g/mol), or KF-861(functional group equivalent weight=1,600 g/mol), and amino polyethersuch as X-22-3939A (functional group equivalent weight=1,700 g/mol), allavailable from Shin Etsu Chemical Co., Ltd., Tokyo, Japan.

Various amounts of amino silicone can be selected for the substrate,such as for example, from about 0.01 to about 5.0 weight percent, fromabout 0.1 to about 3.0 weight percent, or from about 0.5 to about 2.0weight percent of the total weight of the substrate.

The amino silicone is represented by the following structures orformulas.

wherein the organic group is one of —RNH₂, —RNHR′NH₂; R, R′ and R″ eachrepresent an alkyl having from about 1 to about 8 carbon atoms; n isfrom about 1 to about 100 and m is from about 1 to about 100.

The polyimide substrate composition can optionally contain apolysiloxane copolymer to enhance or smooth the coating. Theconcentration of the polysiloxane copolymer is less than about 1 weightpercent or less than about 0.01 weight percent. The optionalpolysiloxane copolymer includes a polyester modifiedpolydimethylsiloxane, commercially available from BYK Chemical with thetrade name of BYK® 310 (about 25 weight percent in xylene) and 370(about 25 weight percent inxylene/alkylbenzenes/cyclohexanone/monophenylglycol=75/11/7/7); apolyether modified polydimethylsiloxane, commercially available from BYKChemical with the trade name of BYK® 330 (about 51 weight percent inmethoxypropylacetate) and 344 (about 52.3 weight percent inxylene/isobutanol=80/20), BYK®-SILCLEAN 3710 and 3720 (about 25 weightpercent in methoxypropanol); a polyacrylate modifiedpolydimethylsiloxane, commercially available from BYK Chemical with thetrade name of BYK®-SILCLEAN 3700 (about 25 weight percent inmethoxypropylacetate); or a polyester polyether modifiedpolydimethylsiloxane, commercially available from BYK Chemical with thetrade name of BYK® 375 (about 25 weight percent in Di-propylene glycolmonomethyl ether). The polyimide, the amino silicone and thepolysiloxane polymer of the substrate are present in a weight ratio ofabout 99.98/0.01/0.01 to about 94/5/1.

The disclosed polyimide substrate layer 210 possesses a Young's modulusof from about 4,000 MPa to about 10,000 MPa, or from about 5,000 MPa toabout 9,000 MPa, or from about 6,000 MPA to about 8,000 MPa; and anonset decomposition temperature of from about 500° C. to about 650° C.,or from about 540° C. to about 625° C., or from about 580° C. to about620° C.

Also described herein is a composition used in a process of preparing aseamless polyimide belt for a fuser belt substrate via flow coating. Ina centrifugal molding process, a thin fluorine or silicone release layeris applied on the inside of a rigid cylindrical mandrel, and then thepolyimide layer is applied and subsequently cured and released from themandrel. Using a flow coating process and the disclosed compositioneliminates the requirement of an extra release layer, thus reducingmanufacturing cost.

The composition of the substrate layer comprises a polyamic acid such asa polyamic acid of pyromellitic dianhydride/4,4-oxydianiline and aninternal release agent of a amino silicone. The internal release agentis present in an amount of from about 0.01 weight percent to about 5weight percent or from about 0.1 weight percent to about 3 weightpercent or from about 0.5 weight percent to about 2.0 weight percent ofthe layer. The amino silicone release agent is needed to fully releasethe polyimide layer from the stainless steel substrate.

The polyimide-amino silicone composition is flow coated on a weldedstainless steel belt or an electroformed seamless nickel belt at thedesired product circumference. The polyimide-amino silicone belt ispartially cured, or pre-cured, at from about 150° C. to about 250° C.,or from about 180° C. to about 220° C. for a time of from about 30minutes to about 90 minutes, or from about 45 minutes to about 75minutes, and self releases from the stainless steel belt orelectroformed seamless nickel belt, and then is further completely curedat from about 250° C. to about 370° C., or from about 300° C. to about340° C., for a time of from about 30 minutes to about 150 minutes, orfrom about 60 minutes to about 120 minutes under tension in theconfiguration shown in FIG. 4. This final curing is at a tension of fromabout 1 kilogram to about 10 kilograms. As shown in FIG. 4, thepre-cured belt 210 is tensioned between two rollers 250 while rotatingthe direction of arrow 20. The final curing produces a belt thatexhibits a modulus suitable for use as a fuser member.

The seam thickness and profile of the seamed stainless steel belt can beminimized, and the surface finish and roughness of the substrate beltcan be specified. For example, a rough lathed or honed belt is betterfor the polyimide layer release. Such a configuration easily allows theproduction of belts of various lengths and widths. Using a rotatingmandrel limits the width and length of the belts able to be produced aseach belt requires a separate mandrel.

In one embodiment, the coating belt substrate is a rough lathed beltsubstrate with a R_(a) (average roughness) of from about 0.01 micron toabout 0.5 micron, or from about 0.05 micron to about 0.3 micron, or fromabout 0.1 micron to about 0.2 micron; and a R_(max) (maximum roughness)or from about 0.05 micron to about 2 micron, or from about 0.1 micron toabout 1 micron, or from about 0.2 micron to about 0.7 micron. The backof the polyimide fuser substrate flow coated from this substrate issimilarly rough lathed.

In another embodiment, the coating belt substrate is a honed beltsubstrate with a R_(a) of from about 0.15 micron to about 1 micron, orfrom about 0.2 micron to about 0.8 micron, or from about 0.3 micron toabout 0.7 micron; and a R_(max) of from about 0.5 micron to about 10microns, or from about 1 micron to about 7 microns, or from about 2microns to about 4 microns. The back of the polyimide fuser substrateflow coated from this substrate is similarly honed.

The polyimide-amino silicone layer thickness can be achieved by singlepass or multi pass coating. For single pass, the polyimide layer iscoated, and pre-cured at a temperature between about 125° C. and about190° C. for a time of about 30 minutes to about 90 minutes, and thenfully cured at a temperature between about 250° C. and about 370° C. fora time of about 30 minutes to about 90 minutes. For multi-pass, such asdual pass, the bottom polyimide layer is coated on a substrate andpre-cured between about 125° C. and about 190° C. for a time of about 30minutes to about 90 minutes, and the top polyimide layer is subsequentlycoated and pre-cured between about 125° C. and about 190° C. for a timeof about 30 minutes to about 90 minutes, and then the dual layerpolyimide layer is fully cured at a temperature between about 250° C.and about 370° C. for a time of about 30 minutes to about 90 minutes. Inan embodiment a stainless steel belt is used as the coating substrate.The substrate is rotated at a speed of from about 20 rpm to about 100rpm, or from about 40 rpm to about 60 rpm during the thermal curing ofthe coating.

The polyimide-amino silicone substrate composition includes a solvent.Examples of the solvent selected to form the composition includetoluene, hexane, cyclohexane, heptane, tetrahydrofuran, methyl ethylketone, methyl isobutyl ketone, N,N′-dimethylformamide,N,N′-dimethylacetamide, N-methyl pyrrolidone (NMP), methylene chlorideand the like. The solvent is selected, for example, in an amount of fromabout 70 weight percent to about 95 weight percent, and from 80 weightpercent to about 90 weight percent based on the amounts in the coatingmixture.

Additives and additional conductive or non-conductive fillers may bepresent in the above-described composition. In various embodiments,other filler materials or additives including, for example, inorganicparticles, can be used for the coating composition and the subsequentlyformed surface layer. Fillers used herein include carbon blacks suchaluminum nitride, boron nitride, aluminum oxide, graphite, graphene,copper flake, nano diamond, carbon black, carbon nanotube, metal oxides,doped metal oxide, metal flake, and mixtures thereof. In variousembodiments, other additives known to one of ordinary skill in the artcan also be included to form the disclosed composite materials.

The composition is coated on a substrate in any suitable known manner.Typical techniques for coating such materials on the substrate layerinclude flow coating, liquid spray coating, dip coating, wire wound rodcoating, fluidized bed coating, powder coating, electrostatic spraying,sonic spraying, blade coating, molding, laminating, and the like.

Specific embodiments will now be described in detail. These examples areintended to be illustrative, and not limited to the materials,conditions, or process parameters set forth in these embodiments. Allparts are percentages by solid weight unless otherwise indicated.

EXAMPLES

A composition comprising polyamic acid of biphenyl tetracarboxylicdianhydride/4,4′-oxydianiline/amino silicone=99.8/0.2 was prepared inNMP at about 16 weight percent solids. The polyamic acid was U-VARNISHS; and the amino silicone was KF-8010. The composition liquid was flowcoated on a stainless steel belt substrate, and subsequently cured at75° C. for 30 minutes, 190° C. for 30 minutes and 320° C. for 60minutes. The resulting polyimide fuser belt self released from thestainless steel belt substrate, and an 80 μm smooth polyimide belt wasobtained.

The polyimide/amino silicone belt was further tested for modulus, andonset decomposition temperature. The modulus was about 5,700 MPa, andthe onset decomposition temperature was about 596° C. As comparison,Nitto Denko KUC polyimide belt's modulus is about 6,000 MPa, and itsonset decomposition temperature is about 530° C.

The key properties of the disclosed polyimide/amino silicone fuser beltwere comparable to those of commercially available polyimide belts,however with lower manufacturing cost due to elimination of the extrarelease layer coating.

It will be appreciated that variants of the above-disclosed and otherfeatures and functions or alternatives thereof may be combined intoother different systems or applications. Various presently unforeseen orunanticipated alternatives, modifications, variations, or improvementstherein may be subsequently made by those skilled in the art, which arealso encompassed by the following claims.

1. A fuser member comprising: a substrate layer comprising a polymerblend of polyimide and amino silicone.
 2. The fuser member of claim 1wherein the amino silicone is represented by structures selected fromthe group consisting of:

wherein the organic group is one of —RNH₂, —RNHR′NH₂; R, R′ and R″ eachrepresent an alkyl having from about 1 to about 8 carbon atoms; n isfrom about 1 to about 100 and m is from about 1 to about
 100. 3. Thefuser member of claim 1 wherein the polyimide and the amino silicone arepresent in a weight ratio of about 99.99/0.01 to about 99/5.
 4. Thefuser member of claim 1 wherein the substrate layer further comprises apolysiloxane polymer.
 5. The fuser member of claim 4 wherein thepolysiloxane polymer is selected from the group consisting of apolyester modified polydimethylsiloxane, a polyether modifiedpolydimethylsiloxane, a polyacrylate modified polydimethylsiloxane, anda polyester polyether modified polydimethylsiloxane.
 6. The fuser memberof claim 4 wherein the polyimide, the amino silicone and thepolysiloxane polymer are present in a weight ratio of about99.98/0.01/0.01 to about 94/5/1.
 7. The fuser member of claim 1 whereinthe substrate layer further comprises fillers.
 8. The fuser member ofclaim 7 wherein the fillers are selected from the group consisting ofaluminum nitride, boron nitride, aluminum oxide, graphite, graphene,copper flake, nano diamond, carbon black, carbon nanotube, metal oxides,doped metal oxide, metal flake, and mixtures thereof
 9. The fuser memberof claim 1 further comprising: an intermediate layer disposed on thesubstrate layer; and a release layer disposed on the intermediate layer.10. The fuser member of claim 9 wherein the intermediate layer comprisessilicone.
 11. The fuser member of claim 9 further wherein the releaselayer comprises a fluoropolymer.
 12. A fuser member comprising: asubstrate layer comprising a polymer blend of polyimide and aminosilicone; an intermediate layer comprising a material selected from thegroup consisting of silicone and fluoroelastomer; and a release layerdisposed on the intermediate layer comprising a fluoropolymer.
 13. Thefuser member of claim 12 wherein the amino silicone is represented bystructures selected from the group consisting of:

wherein the organic group is one of —RNH₂ or —RNHR′NH₂; R, R′ and R″each represent an alkyl having from about 1 to about 8 carbon atoms; nis from about 1 to about 100 and m is from about 1 to about
 100. 14. Thefuser member of claim 12 wherein the release layer further comprisesfillers.
 15. The fuser member of claim 14 wherein the fillers areselected from the group consisting of aluminum nitride, boron nitride,aluminum oxide, graphite, graphene, copper flake, nano diamond, carbonblack, carbon nanotube, metal oxides, doped metal oxide, metal flake,and mixtures thereof; and wherein the fluoropolymer comprises afluoroelastomer or a fluoroplastic.
 16. The fuser member of claim 12further comprising: an adhesive layer disposed on the intermediate layeror the substrate layer.
 17. A fuser member comprising: a layercomprising a polymer blend of polyimide and amino silicone, representedby structures selected from the group consisting of:

wherein the organic group is one of —RNH₂ or —RNHR′NH₂; R, R′ and R″each represent an alkyl having from about 1 to about 8 carbon atoms; nis from about 1 to about 100 and m is from about 1 to about
 100. 18. Thefuser member of claim 17 wherein the amino silicone comprises from about0.01 to about 2.0 weight percent of the polymer blend
 19. The fusermember of claim 1 wherein the polyimide comprises from about 99.99weight percent to about 95.0 weight percent of the polymer blend. 20.The fuser member of claim 1 wherein the substrate layer comprises athickness of from about 10 microns to about 250 microns.